Description
The “ISS method” provides high sharpness image even with low dose
The main characteristic of FUJIFILM’s new proprietarytechnology”ISS method 2 ” is realized by placing the TFT sensor on the front side of the scintillation layer where the TFT sensor of an existing panel is located on the back side. By using this new method, scattering/reduction of X-ray signal is significantly improved(resulting in improved MTF). Also, optimization of the scintillation layer of the panel is achieved by FUJIFILM’s own precision coating technology cultivated by manufacturing Imaging Plate(IP) for many years(resulted in improvement of DQE).